Cart (Loading....) | Create Account
Close category search window
 

Reactor design considerations for MOCVD growth of thin films

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Nami, Z. ; Microelectron. Res. Center, Georgia Inst. of Technol., Atlanta, GA, USA ; Erbil, A. ; May, G.S.

Metal-organic chemical vapor deposition (MOCVD) performance is optimized for growing titanium dioxide (TiO2) thin films. Different gas flow directions and susceptor rotation, along with reactor geometry and shape variations are considered. Gravity proves to be an important parameter in changing the flow pattern in the reaction chamber. However, since film uniformity is not improved by changing the flow direction, modifying the reactor geometry is also proposed. Among the different geometrical parameters, the susceptor-inlet distance, inlet tube diameter, and susceptor size are considered. To minimize the occurrence of recirculation cells in the reaction chamber, modifications in the reactor shape are also suggested. Acceptable results are achieved by changing the cylindrical reactor to a diamond shape

Published in:

Semiconductor Manufacturing, IEEE Transactions on  (Volume:10 ,  Issue: 2 )

Date of Publication:

May 1997

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.