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Collective buckling of line arrays created by soft lithography

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3 Author(s)
Chen, Ziguang ; Department of Engineering Mechanics and Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, Nebraska 68588-0526 ; Yang, Jiashi ; Tan, Li

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The authors analyze the collective buckling of an array of elastic lines with their lower edges built into an elastic substrate of the same material. These lines can interact among themselves through the deformation of the substrate. From the theory of elasticity and elastic structures, an eigenvalue problem is formulated and solved. Calculations show that the lines can buckle collectively into certain ordered patterns, where some of which have been confirmed by experiments. The results are useful for the understanding, design, and application of the nanostructures produced by soft lithography and other embossing techniques.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:29 ,  Issue: 2 )

Date of Publication:

Mar 2011

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