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A new all ternary In0.52Al0.48As-In0.53Ga0.47As-In0.52Al0.48As double heterojunction bipolar transistor (DHBT) showing complete elimination of current blocking has been grown using solid source molecular beam epitaxy (MBE). The development of the DHBT required careful epitaxial design trade-offs which culminated in an optimum structure achieving ground breaking RF performance in excess of 100 GHz and excellent DC performance for emitter dimensions of 1×5 μm2. These new DHBTs which only use ternary alloys lead to simplified device growth and fabrication options.
Date of Conference: 25-27 Oct. 2010