Referenced Items are not available for this document.
Device structures in high refractive index materials, notably semiconductors such as silicon, will form the basis for high-density integrated photonics. Nanometre-scale structuring - in conjunction with photonic crystal, photonic wire and plasmonic/metamaterial principles - will be required in order to realise the full potential for a variety of applications.
Published in:
Advanced Optoelectronics and Lasers (CAOL), 2010 International Conference on
Date of Conference: 10-14 Sept. 2010
- Page(s):
- 1 - 3
- Print ISBN:
- 978-1-4244-7043-3
- INSPEC Accession Number:
- 11651958
- Conference Location :
- Sevastopol
- Digital Object Identifier :
- 10.1109/CAOL.2010.5634281
- Product Type:
- Conference Publications
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