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Strategies for high energy ion implant

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3 Author(s)
J. L. Kawski ; Genus Inc., Newburyport, MA, USA ; J. O. Borland ; J. P. O'Connor

Summary form only given, as follows. Device Fab that employ High Energy (MeV)Ion Implant realize overall front end manufacturing cost reductions of up to 20%, For this reason MeV implant tools represent one of the fastest growing segments in the fab capital equipment market today. Implementing MeV implant into a process has new challenges for designers and process engineers alike. Process integration requires a logical strategy that fits a company's relative aggressiveness in implementing significant cost reduction measures. Production process development and sustaining engineering require understanding of the tool specifics and unique process challenges associated with MeV implant. This paper discusses various cost reduction scenarios. There will be a review of production confirmed process migration and implementation

Published in:

Advanced Semiconductor Manufacturing Conference and Workshop, 1996. ASMC 96 Proceedings. IEEE/SEMI 1996

Date of Conference:

12-14 Nov 1996