By Topic

Photocluster productivity improvement

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

1 Author(s)
Sisler, S.B. ; Microelectron. Div., IBM Corp., Essex Junction, VT, USA

This paper describes improvements being implemented in a multi-technology, multi-partnumber IBM semiconductor fabricator to increase photocluster output. The work of various teams is presented, which have generated a host of enhancements, including a customized logistics system, host computer control, continuous lot chaining, a work-in-process (WIP) and reticle tracking system, area alarms for tool stoppages, staffing based on activity analysis, operator coverage improvements guided by delays determined from host control data and alignment assist reductions guided by host control data. Photocluster productivity has increased 35% since these changes were begun and more improvement is anticipated

Published in:

Advanced Semiconductor Manufacturing Conference and Workshop, 1996. ASMC 96 Proceedings. IEEE/SEMI 1996

Date of Conference:

12-14 Nov 1996