Cart (Loading....) | Create Account
Close category search window
 

Analysis and Application of a Parallel E-Class Amplifier as RF Plasma Source

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

11 Author(s)
Peña-Eguiluz, R. ; Plasmas Phys. Lab., Inst. Nac. de Investig. Nucl., Mexico City, Mexico ; Pérez-Martínez, J.A. ; López-Callejas, R. ; Mercado-Cabrera, A.
more authors

The design and construction of a 13.56-MHz RF power amplifier has been carried out on the basis of a modified resonant LC circuit in parallel regarding to the classic E-class amplifier LC series resonant circuit; this was done in order to take advantage of the operation characteristics of the resonant capacitor as a bidirectional voltage source. Therefore, the parallel LC circuit amplifies the voltage signals which can be applied to resistive or capacitive-resistive loads without the need for an impedance matching network, conventionally used with plasma generators. The main achievement of the described instrumentation lays in its constant response under a wide interval of load impedance. This facility has been applied to the generation of steady discharges in plasma needle appliances and both parallel plate and coaxial dielectric barrier discharge (DBD) reactors. Some relevant results of the DBD sterilization of four different kinds of microorganisms are included, showing the feasibility of the technique within reduced processing times, under 80 s in all the cases.

Published in:

Plasma Science, IEEE Transactions on  (Volume:38 ,  Issue: 10 )

Date of Publication:

Oct. 2010

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.