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The nanoimprint molds are usually fabricated by electron beam (EB) lithography. In recent years, a large-area mold fabrication with a high throughput is required to use nanoimprint lithography to produce devices in mass production. Using a conventional EB system to fabricate a large-area mold requires a very long exposure. To shorten the time, the authors have newly developed an EB stepper. The hole pattern (300 nm hole and 600 nm pitch) was exposed on a whole 4 in.