Referenced Items are not available for this document.
In this paper, a rapid deposition method is developed for thin film poly-Si growth on various cheap borosilicate glasses. The depositing film is smooth and its thickness can be well controlled at 50 ¿m. The film thickness is mainly determined by the pulling-speed of glass substrates. The grain size of the film varies from 30-100 ¿m. Sinton PCD measurement indicates the effective lifetime ¿ above 1.1 ¿s after SiNx coating on the front surface and forming gas annealing. The actual lifetime can be even higher because of lack of passivation on the rear surface.
Published in:
Photovoltaic Specialists Conference (PVSC), 2009 34th IEEE
Date of Conference: 7-12 June 2009
- Page(s):
- 000096 - 000099
- ISSN :
- 0160-8371
- E-ISBN :
- 978-1-4244-2950-9
- Print ISBN:
- 978-1-4244-2949-3
- INSPEC Accession Number:
- 11152108
- Conference Location :
- Philadelphia, PA
- Digital Object Identifier :
- 10.1109/PVSC.2009.5411727
- Product Type:
- Conference Publications
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