Cart (Loading....) | Create Account
Close category search window
 

A 3D profile simulator for inclined/multi-directional UV lithography process of negative-tone thick photoresists

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Zhen Zhu ; Key Lab. of MEMS of Minist. of Educ., Southeast Univ., Nanjing, China ; Qing-An Huang ; Wei-Hua Li ; Zai-Fa Zhou

A three-dimensional (3D) profile simulator that integrates aerial image module, exposure module, post-exposure bake (PEB) module and development module is presented in this paper for the inclined/multi-directional ultraviolet (UV) lithography of negative thick photoresist such as SU-8. Based on the scalar diffraction theory, the improved paraxial approximation and Fresnel approximation solutions are developed to simulate the inclined UV light intensity distribution into photoresist with the refraction, the absorption of SU-8 and the reflection at substrate surface incorporated effectively. A 3D dynamic cellular automate method for photoresist etching simulation is improved to calculate the final development patterns efficiently and accurately. The 3D profiles of oblique developed photoresist with or without reflection-induced structures as well as multi-directional-exposure structures are successfully predicted by this simulator, which demonstrate good agreement with the experimental results.

Published in:

Sensors, 2009 IEEE

Date of Conference:

25-28 Oct. 2009

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.