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Nanofabrication module integrated with optical aligner

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8 Author(s)
Stuart, Colin ; Department of Mechanical and Aerospace Engineering, University of California, Los Angeles, 420 Westwood Plaza, Los Angeles, California 90095 ; Xu, Qianfei ; Tseng, Ricky J. ; Yang, Yang
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In this article, we describe a simple module that can be integrated with a commercial optical aligner for nanoimprint lithography or optical lithography. The module provides a convenient low-cost technique to transform an optical aligner for microfabrication into a nanofabrication machine. This combination enables the creation of nanoscale features and alignment of multiple-layer lithographic patterns with submicron accuracy within one instrument. Imprinting of 30 nm half-pitch lines has been demonstrated by the module, as well as submicron alignment. The module has also been used to fabricate micro- and nanoscale patterns simultaneously by the combination of optical and imprint lithography.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:24 ,  Issue: 2 )