By Topic

Nanofabrication module integrated with optical aligner

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

8 Author(s)
Stuart, Colin ; Department of Mechanical and Aerospace Engineering, University of California, Los Angeles, 420 Westwood Plaza, Los Angeles, California 90095 ; Xu, Qianfei ; Tseng, Ricky J. ; Yang, Yang
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link: 

In this article, we describe a simple module that can be integrated with a commercial optical aligner for nanoimprint lithography or optical lithography. The module provides a convenient low-cost technique to transform an optical aligner for microfabrication into a nanofabrication machine. This combination enables the creation of nanoscale features and alignment of multiple-layer lithographic patterns with submicron accuracy within one instrument. Imprinting of 30 nm half-pitch lines has been demonstrated by the module, as well as submicron alignment. The module has also been used to fabricate micro- and nanoscale patterns simultaneously by the combination of optical and imprint lithography.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:24 ,  Issue: 2 )