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Nanoimprint process using epoxy-siloxane low-viscosity prepolymer

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3 Author(s)
Viallet, Benoit ; LAAS/CNRS - 7, Avenue du Colonel Roche 31077 Toulouse CEDEX 04, France ; Gallo, P. ; Daran, Emmanuelle

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.1835319 

In conventional nanoimprint lithography, relatively high pressures and high temperature are used for embossing thermoplastics. However, this may induce mechanical strain in the mold and sample, and prohibits patterning of fragile substrates. Polymer flow in the viscoelastic regime is quite a slow process that can also limit patterning performances. To overcome these difficulties, a low-pressure and moderate-temperature imprint process using a low-viscosity thermocurable epoxy-siloxane prepolymer is proposed. We demonstrate replicated patterns with 60 nm lines and 150 nm space, and less than 20 nm residual layer. The low-viscosity process also allows for the simultaneous replication of micrometer- and nanometer-scaled patterns. Transfer onto silicon substrate via reactive-ion etching or lift-off is possible without removing the residual layer.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:23 ,  Issue: 1 )