By Topic

Deposition of silica-silver nanocomposites by magnetron cosputtering

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

The purchase and pricing options are temporarily unavailable. Please try again later.
6 Author(s)
Boscarino, Diego ; INFN Laboratori Nazionali di Legnaro, Viale dell’Università 2, 35020 Legnaro (PD), Italy and INFM Unità di Ricerca di Padova, Via Marzolo 8, 35131 Padova, Italy ; Vomiero, Alberto ; Mattei, Giovanni ; Quaranta, Alberto
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link: 

Thin films have been grown on silicon and silica substrates by cosputtering of silica and silver in Ar, Ar+2.5%O2, and Ar+5%O2 gas mixtures. Rutherford backscattering spectrometry showed that the films have Ag atomic fractions xAg in the range of ∼1 to ∼10 at. %, and, by valence considerations, that the fraction of oxidized Ag in the films deposited in presence of oxygen is limited. Transmission electron microscopy images revealed the presence of Ag nanoclusters, with a mean size diameter not larger than 5 nm. The clusters are preferentially arranged along columns. It is suggested that the columns are regions with diameter in the nanometer range in which the density of the dielectric matrix is lower, thus favoring the formation of metal clusters. In presence of O2, the clusters were observed to have a more regular spherical shape. The optical absorption spectra of films grown in presence of O2 are distinguished from those grown in Ar by specific features, which are attributed to oxidation at the cluster surface.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:23 ,  Issue: 1 )