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Influence of pattern density in nanoimprint lithography

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7 Author(s)
Gourgon, C. ; Laboratoire des Technologies de la Microelectronique (CNRS), 17 rue des Martyrs (CEA-LETI), 38054 Grenoble Cedex, France ; Perret, C. ; Micouin, G. ; Lazzarino, F.
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Polymer selection and critical dimension control across the wafer are key parameters for the nanoimprint lithography technique. This nanotechnology requires polymers having a low glass transition temperature Tg combined with a good etch resistance. In this work, three different polymers have been evaluated. The influence of the temperature and pressing time is analyzed to clarify the correlation between polymer behavior and printing uniformity as a function of the pattern density. Measurements of the polymer residual thickness show that the printing uniformity is strongly correlated with the thermal properties of the polymer. © 2003 American Vacuum Society.

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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:21 ,  Issue: 1 )