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Fabrication and characterization of a micromachined 5 mm inductively coupled plasma generator

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3 Author(s)
Hopwood, J. ; Electrical and Computer Engineering Department, Northeastern University, Boston, Massachusetts 02115 ; Minayeva, O. ; Yin, Y.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.1288945 

The electron temperature and ion density produced by a microfabricated plasma generator are characterized in both argon gas and air. The plasma generator sustains a discharge by inductively coupling 450 MHz rf power into a small (10 mm diameter) vacuum chamber. The inductively coupled plasma source is surface micromachined on a glass wafer by electroplating a planar spiral inductor and two interdigitated capacitors. A plasma can be sustained using gas pressures between 0.1 and 10 Torr and rf powers between 0.3 and 3 W. The ion density increases from 1010 to 1011cm-3 over this range of power. The electron temperature decreases from 4 to 2 eV as the pressure increases from 0.1 to 1 Torr. © 2000 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:18 ,  Issue: 5 )

Date of Publication:

Sep 2000

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