Cart (Loading....) | Create Account
Close category search window

Fabrication and characterization of a micromachined 5 mm inductively coupled plasma generator

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Hopwood, J. ; Electrical and Computer Engineering Department, Northeastern University, Boston, Massachusetts 02115 ; Minayeva, O. ; Yin, Y.

Your organization might have access to this article on the publisher's site. To check, click on this link: 

The electron temperature and ion density produced by a microfabricated plasma generator are characterized in both argon gas and air. The plasma generator sustains a discharge by inductively coupling 450 MHz rf power into a small (10 mm diameter) vacuum chamber. The inductively coupled plasma source is surface micromachined on a glass wafer by electroplating a planar spiral inductor and two interdigitated capacitors. A plasma can be sustained using gas pressures between 0.1 and 10 Torr and rf powers between 0.3 and 3 W. The ion density increases from 1010 to 1011cm-3 over this range of power. The electron temperature decreases from 4 to 2 eV as the pressure increases from 0.1 to 1 Torr. © 2000 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:18 ,  Issue: 5 )

Date of Publication:

Sep 2000

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.