Referenced Items are not available for this document.
Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.591146
The feasibility of using sculptured thin film technology to engineer multiphase low-permittivity (also called low-k) materials for microelectronic and electronic packaging applications is established via a numerical study. The chosen films are theoretically modeled as multiphase, uniaxial, dielectric nanocomposite materials and their anisotropic relative permittivity tensors are estimated using the Bruggeman formalism. © 2000 American Vacuum Society.
Published in:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
(Volume:18
,
Issue:
1
)
Date of Publication: Jan 2000
- Page(s):
- 32 - 36
- ISSN :
- 1071-1023
- Digital Object Identifier :
- 10.1116/1.591146
- Product Type:
- Journals & Magazines
- Date of Current Version :
- 18 June 2009
- Issue Date :
- Jan 2000
About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies
A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.
