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Nanometer table-top proximity x-ray lithography with liquid-target laser-plasma source

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4 Author(s)
Malmqvist, L. ; Department of Physics, Lund Institute of Technology, P.O. Box 118, S-221 00 Lund, Sweden ; Bogdanov, A.L. ; Montelius, L. ; Hertz, H.M.

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A compact laser-plasma proximity x-ray lithography system suitable for laboratory-scale low-volume nanometer patterning is presented. The laser-plasma source, which is based on a fluorocarbon liquid-jet target, generates high-brightness λ=1.2–1.7 nm x-ray emission with only negligible debris production. The Au/SiNx x-ray mask is fabricated by employing ion milling and a high-contrast e-beam resist. With SAL-601 chemically enhanced resist we demonstrate fabrication of high-aspect-ratio, sub-100 nm structures. The exposure time is currently 20 min using a compact 10 Hz, λ=532 nm, 70 mJ/pulse mode-locked Nd:YAG laser. However, the regenerative liquid-jet target is designed for operation with future, e.g., 1000 Hz, lasers resulting in projected exposure times of ∼10 s. © 1997 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:15 ,  Issue: 4 )