By Topic

Effect of substrate temperature and annealing on the structural properties of ZnO ultrafine particle films

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

The purchase and pricing options are temporarily unavailable. Please try again later.
5 Author(s)
Dachun, Zhao ; Department of Physics, East China University of Science and Technology, Shanghai 200237, People’s Republic of China ; Zhongkai, Qu ; Xiaoren, Pan ; Muji, Dai
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.589413 

ZnO ultrafine particle (UFP) films were deposited on glass and SiO2 substrates by a direct current gas discharge activated reactive evaporation method. The effect of substrate temperature and annealing on the structure and morphology of ZnO UFP films was studied by x-ray diffraction and scanning electron microscope. The results show that the spherical island density decreases with increasing annealing temperature and the structure becomes polycrystalline with a (002) preferential orientation as the substrate temperature increases. In addition, angle resolved x-ray photoelectron spectroscopy was used to study the absorption of water on the ZnO UFP film surface by measuring the two deconvoluted peaks for O 1s. The two deconvoluted peaks for O 1s were located at 533.2 and 534.8 eV. The absorption coefficients of water on the surface were 0.52 and 0.43, respectively, for nonannealed and annealed ZnO UFP films. © 1997 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:15 ,  Issue: 4 )