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Effect of pressure on dc planar magnetron sputtering of platinum

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1 Author(s)
Thomas, John H. ; 3M Company/CED, 3M Center, St. Paul, Minnesota 55144

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.1564027 

Argon pressure in the 10 to 200 mTorr range was shown to have a profound effect on the deposition characteristics of nonreactive platinum. Two features were observed. The film thickness does not vary rapidly with deposition pressure, and, the density of the film varies rapidly from near bulk to a much lower value at pressures above 50 mTorr. Films at low pressures have a density of ∼20.8 g/cm3 and well defined “columnar structure.” At high pressures (200 mTorr), the density drops to as low as ∼9 g/cm3. Porosity, or void structure, is dominant at high pressure and the columnar structure is still present. © 2003 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:21 ,  Issue: 3 )

Date of Publication:

May 2003

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