By Topic

Ellipsometric method for real time control of thin film deposition on imperfect substrates

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Hofrichter, A. ; Laboratoire de Physique des Interfaces et des Couches Minces (UMR 7647 du CNRS), Ecole Polytechnique, 91128 Palaiseau, France ; Heitz, T. ; Bulkin, P. ; Drevillon, B.

Your organization might have access to this article on the publisher's site. To check, click on this link: 

In this work we present a method of the ellipsometric control for optical filter deposition. This control procedure uses the length of the real time ellipsometric trajectory as a control parameter with respect to the length of precalculated target trajectory. This control method has been adapted for substrates whose optical structure cannot be adequately modeled. In this case an effective refractive index and absorption coefficient is assigned to the substrate, which is determined by computing the length of the experimental trajectory from the deposition of a reference layer. This effective refractive index is used to compute the target trajectory. The control procedure has been applied to the deposition of a graded index antireflection coating on Corning and float glass by plasma enhanced chemical vapor deposition. Spectrophotometry transmission measurements show the high efficiency of the control method with respect to uncontrolled filter deposition. © 2002 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:20 ,  Issue: 3 )