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Influence of standing-wave electric field pattern on the laser damage resistance of HfO2 thin films

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6 Author(s)
Protopapa, M.L. ; Istituto Nazionale di Fisica della Materia, INFM, Dipartimento di Fisica, Università di Lecce, 73100 Lecce, Italy ; Alvisi, M. ; De Tomasi, F. ; Di Giulio, M.
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Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.1460892 

The standing-wave electric field pattern that forms inside an optical coating as a consequence of laser irradiation is one of the factors influencing the coating laser-induced damage threshold. The influence of the standing-wave electric field profile on the damage resistance to ultraviolet radiation of hafnium dioxide (HfO2) thin films was investigated in this work. To this end, HfO2 thin films of different thicknesses deposited by the electron beam evaporation technique at the same deposition conditions were analyzed. Laser damage thresholds of the samples were measured at 308 nm (XeCl laser) by the photoacoustic beam deflection technique and microscopic inspections. The dependence of the laser damage threshold on the standing-wave electric field pattern was analyzed. © 2002 American Vacuum Society.

Published in:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:20 ,  Issue: 3 )

Date of Publication: May 2002

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