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Characteristics of zinc oxide deposited on copper metallized Si substrates

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2 Author(s)
Chang, Y.S. ; Department of Materials Science and Engineering, National Cheng Kung University, Tainan, Taiwan ; Jyh-Ming Ting

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.1376707 

Sputter deposition of ZnO on Si specimens with surface metallization of copper was performed using a radio frequency sputter deposition technique using various deposition temperatures and ratio of O2/Ar. Copper metallization was carried out using an ion beam sputter deposition technique at different temperatures. Specimens were analyzed for the thickness, crystal structure, microstructure, and composition. Effects of deposition variables were discussed. © 2001 American Vacuum Society.  

Published in:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:19 ,  Issue: 5 )

Date of Publication: Sep 2001

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