Referenced Items are not available for this document.
This paper describes a new data preparation technique, which allows for the design of optical lenses in a conventional CAD package and immediate transfer to a lithographic system, for example Electron Beam or Focused Ion Beam Lithography. Most importantly, we show that this approach could be used to fabricate lens arrays in templates for Step-and Flash Imprint lithography onto 4iquestwafers. One application for this is to enhancing AlGaInP LED performance by texturing the top current spreading layer.
Published in:
Nanotechnology, 2007. IEEE-NANO 2007. 7th IEEE Conference on
Date of Conference: 2-5 Aug. 2007
- Page(s):
- 49 - 52
- E-ISBN :
- 978-1-4244-0608-1
- Print ISBN:
- 978-1-4244-0607-4
- INSPEC Accession Number:
- 10145131
- Conference Location :
- Hong Kong
- Digital Object Identifier :
- 10.1109/NANO.2007.4601138
- Product Type:
- Conference Publications
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