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This paper describes a new data preparation technique, which allows for the design of optical lenses in a conventional CAD package and immediate transfer to a lithographic system, for example Electron Beam or Focused Ion Beam Lithography. Most importantly, we show that this approach could be used to fabricate lens arrays in templates for Step-and Flash Imprint lithography onto 4iquestwafers. One application for this is to enhancing AlGaInP LED performance by texturing the top current spreading layer.
Date of Conference: 2-5 Aug. 2007