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A robust, reliable method of building high-precision MIM (metal-insulator-metal) capacitors with low Vcc, high matching performance and integrated in a 0.18um mixed signal process with sub- 0.35um metallization rules has been demonstrated. Top plate and hardmask materials, along with the influence of top plate etch on defect density have been presented. An innovative method of reducing voltage coefficient for a MIM capacitor has also been reported.
Date of Conference: 5-7 May 2008