An XPS Study on N Doped TiO2 Sol-Gel Thin Films

In this paper we report on a systematic XPS study on N doped TiO
₂
sol-gel thin films deposited by sol-gel technique. For this purpose, four kinds of multilayered TiO
₂
films thermally treated in O
₂
and NH
₃
at 500 and 600degC were deposited on quartz substrate by sol-gel & dipping method. A special attention has been focused on Nls and Ti2p photoelectron lines behaviour as a function of temperature and atmosphere of annealing process in order to investigate the features of the Ti-O-N bonds.