By Topic

Optical and Microstructural Properties of Sol-Gel TiOxNy Thin Films

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

The purchase and pricing options are temporarily unavailable. Please try again later.
6 Author(s)
Trapalis, C. ; Inst. of Mater. Sci., NCSR "Demokritos", Athens ; Giannakopoulou, T. ; Todorova, N. ; Anastasescu, C.
more authors

Titanium oxynitride thin films were deposited by sol-gel method on quartz substrate in an attempt to study the microstructural and optical properties of TiOxNy films deposited by sol-gel method. For this purpose, X-ray diffraction (XRD), atomic force microscopy (AFM), and spectroscopic ellipsometry (SE) investigations were performed. Examining the surface morphology and grain sizes of the films, complex nanostructured surfaces, with a mean cluster size in the range of 20-30 nm were obtained in connection with the preparation method. Regarding their optical properties, it was found a decrease of the optical band gap of N-doped TiO2 films down to the visible range.

Published in:

Semiconductor Conference, 2007. CAS 2007. International  (Volume:2 )

Date of Conference:

Oct. 15 2007-Sept. 17 2007