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Hot embossing technology, one of nanoimprint lithography (NIL) techniques, has been getting attention as an alternative candidate of next generation micro-patterning technologies by the advantages of simplicity and low cost compared to conventional photo-lithographies. For this study of fabrication of partition wall for polymer solar cell, The manufacturing process is made up of three stages as in the following: (i) the stage of lithography process, (ii) the stage of electro-plating process for mold, and (iii) the stage of hot embossing process. As a result, we made 6 inch Ni-mold and hot embossed partition wall for polymer solar cell.
Date of Conference: 9-11 April 2008