Referenced Items are not available for this document.
We present the photosensitive flexopolymer LF55GN as a new material for the realisation of thick three-dimensional microstructures. The latter can be realised with a thickness up to 4 millimetres and with an aspect ratio of 10 using only a single UV exposure step. LF55GN is a unique material that allows fabricating thick components of optical quality that easily absorb stress due to the elastic nature of the material.
Published in:
Micro Electro Mechanical Systems, 2007. MEMS. IEEE 20th International Conference on
Date of Conference: 21-25 Jan. 2007
- Page(s):
- 219 - 222
- ISSN :
- 1084-6999
- E-ISBN :
- 978-1-4244-095-5
- Print ISBN:
- 978-1-4244-0950-1
- INSPEC Accession Number:
- 9871817
- Conference Location :
- Hyogo
- Digital Object Identifier :
- 10.1109/MEMSYS.2007.4432963
- Product Type:
- Conference Publications
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