Cart (Loading....) | Create Account
Close category search window

Run-by-Run Process Control of Metal Sputter Deposition: Combining Time Series and Extended Kalman Filter

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Juhn-Horng Chen ; Chung Hua Univ., Hsinchu ; Tzu-Wei Kuo ; An-Chen Lee

By the time series model, this paper constructed the disturbance model for the aluminum sputter deposition process and derived the extending Kalman filter (EKF) controller based on this new disturbance model. Experimental results reveal that ARI(3,1) model appropriately characterizes the dynamic behavior of the disturbance for the processes. The EKF controller which includes information of process noise and measurement noise is able to regulate the model coefficients automatically as the target is replaced or degrades. In this paper, the d-EWMA controller, time-varying d-EWMA controller, age-based d-EWMA controller, and EKF controller have been applied to aluminum sputter deposition processes for predicting deposition rates and comparing their performances. The application of the EKF controller here is proven to improve the estimating accuracy of the aluminum sputter deposition process significantly, regardless of whether the deposition rates are measured at each run or not.

Published in:

Semiconductor Manufacturing, IEEE Transactions on  (Volume:20 ,  Issue: 3 )

Date of Publication:

Aug. 2007

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.