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Defect Analysis of Electric and Photonic Double Layer Substrate made by SIMOX 3D sculpting

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1 Author(s)
Kishima, Koichiro ; Mater. Labs., Sony Corp., Tokyo

From the viewpoint of electric device fabrication, we examined a SIMOX 3D sculpting method (Koonath, 2003) that three dimensionally integrate electric circuits and photonic circuits on an SOI substrate. We investigated buried optical waveguide structure underneath the silicon surface and defect characteristics on the surface of the substrate made by 8" size SIMOX 3D sculpting. As a result, we showed that balancing between no defects on the silicon surface and a formation of buried waveguide is achievable when the BOX by SIMOX 3D sculpting is continuous

Published in:

International SOI Conference, 2006 IEEE

Date of Conference:

2-5 Oct. 2006