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1 Author(s)
Feely, W.E. ; Rohm & Haas Co., Spring House, PA, USA

Three-dimensional micrometer-scale structures can be prepared from an acid hardening photoresist by the use of a special photomask. Positive-mode structures have surface relief features while the negative mode produces tunnels, chambers, and cantilever beams. The resist chemistry and process are versatile and can be tailored to specific applications. Exploratory work in preparing microstructures is described and possible applications are proposed.<>

Published in:

Solid-State Sensor and Actuator Workshop, 1988. Technical Digest., IEEE

Date of Conference:

6-9 June 1988