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Process flow system for VLSI research and development

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1 Author(s)
Funakoshi, Kiyohiko ; Hitachi Device Dev. Centre, Tokyo, Japan

A process flow system consisting of an intelligent process flow design system, a lot scheduling system and a lot tracking system is discussed. The system has been implemented in a VLSI research and development facility. It is shown that the system substantially increases the design efficiency of various complex process flows and the fabrication efficiency of a wide variety of VLSIs under those process flows

Published in:

Advanced Semiconductor Manufacturing Conference and Workshop, 1992. ASMC 92 Proceedings. IEEE/SEMI 1992

Date of Conference:

30 Sep-1 Oct 1992

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