Referenced Items are not available for this document.
In this study a statistically designed experiment was first used to improve the uniformity of an existing reactor. Three factors were examined in combination in an 8×8 resolution V experiment. Uniformity was noticeably improved on a batch size that was increased from 50 to the minimum goal of 75 wafers. The result of this first experiment did not achieve the process goal, since the uniformities remained unremarkable at 10.9 Ω/sq. across the load, so a different reactor design was tested. Two factors were tested in combination in an experiment using this reactor. Uniformity was improved to 2.2 Ω/sq. across a load size of 125 wafers, which was 67% above the goal
Published in:
Advanced Semiconductor Manufacturing Conference and Workshop, 1992. ASMC 92 Proceedings. IEEE/SEMI 1992
Date of Conference: 30 Sep-1 Oct 1992
- Page(s):
- 136 - 142
- Meeting Date :
- 30 Sep 1992-01 Oct 1992
- Print ISBN:
- 0-7803-0740-2
- INSPEC Accession Number:
- 4529267
- Conference Location :
- Cambridge, MA
- Digital Object Identifier :
- 10.1109/ASMC.1992.253781
- Product Type:
- Conference Publications
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