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A solution of the mask overlay problem in microelectromechanical CAD (MEMCAD)

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2 Author(s)
R. M. Harris ; Microsyst. Technol. Labs., MIT, Cambridge, MA, USA ; S. D. Senturia

The authors present a computationally efficient algorithm for the processing of data from multiple multi-featured masks to produce a planar map of the device topography in a format compatible with mechanical CAD systems.<>

Published in:

Solid-State Sensor and Actuator Workshop, 1992. 5th Technical Digest., IEEE

Date of Conference:

22-25 June 1992