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Application of Back-side Alignment of Thick Layers for the Manufacturing of Advanced Power Devices

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5 Author(s)
Jung Kil Lee ; Fairchild Semicond. Korea, Gyeonggi ; Chisholm, R. ; van der Heijden, M. ; Best, K.
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Back-side alignment was implemented in the thick layer process flow for the production of advanced power devices. The alignment and overlay performance of the back-side alignment scheme are addressed, as well as the benefits in terms of productivity and cost reduction

Published in:
Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE

Date of Conference: 22-24 May 2006

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