We report experimental results from non-invasive second harmonic generation (SHG) measurements applied to detect the presence of contamination at the silicon/buried oxide (BOX) and BOX/substrate interfaces in silicon-on-insulator (SOI) wafers. The potential application of SHG as a metrology tool for process control is demonstrated
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Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE
Date of Conference: 22-24 May 2006