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Lithography for manufacturing of sub-65nm nodes and beyond

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1 Author(s)
Lin, B.J. ; Taiwan Semicond. Manuf. Co., Hsinchu

Lithography is facing unprecedented difficulties to go beyond the 65-nm node with 90-nm half pitch. This presentation shows the types of lithography combined with necessary resolution enhancement techniques to handle the 65-, 45-, 32-, and 22-nm nodes. The pros and cons, feasibility for manufacturing, and economical impacts of these technologies will be compared

Published in:

Electron Devices Meeting, 2005. IEDM Technical Digest. IEEE International

Date of Conference:

5-5 Dec. 2005