By Topic

A simple process to fabricate self-aligned, high-performance torsional microscanners; demonstrated use in a two-dimensional scanner

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Choo, H. ; Berkeley Sensor & Actuator Center, California Univ., Berkeley, CA ; Garmire, D. ; Demmel, J. ; Muller, R.S.

CMOS-compatible process carried out on SOI wafers, we have built high-performance torsional microscanners having vertically offset interdigitated-comb actuators. Our microscanner-fabrication process requires three photolithography masks: two to form the front-side microscanner structures and a third to define the backside openings. Both moving and fixed combs are fabricated in the same device layer (30 mum in thickness), and the offset combs are created by reducing the thickness of the fixed combs, but not that of the moving combs. Our process begins by removing the 1-mum thick thermal oxide selectively to open rectangular windows at locations where the fixed combs are to be defined. In the following step, both fixed- and moving-comb sets are defined simultaneously with a single photolithography mask; this is followed by deep-reactive ion etching (DRIE). We then perform a tuned-etch in the DRIE-etcher to obtain the desired vertical thickness for the fixed combs without affecting the moving combs. The minimum gap between comb fingers can be as small as twice the alignment accuracy of the photolithography process, which is les0.4 mum for state-of-the-art photolithography steppers. We consider these microscanners as especially well adapted for applications to refractive laser surgery of ocular corneas where small spot size and high scan speeds are important assets

Published in:

Optical MEMS and Their Applications Conference, 2005. IEEE/LEOS International Conference on

Date of Conference:

1-4 Aug. 2005