IEEE.org| IEEE Xplore Digital Library| IEEE Standards| IEEE Spectrum| More Sites

Cart (Loading....) | Create Account | 

Close category search window
Author Searchbeta |  Advanced Search  |  Preferences |  Search Tips  |  More Search Options  
 
Browse Conference Publications > Integrated Circuit Design and ... Help

Challenges in implementing high-k dielectrics in the 45nm technology node

Full Text Sign-In or Purchase

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing! close button
puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

8 Author(s)
Lee, B.H. ; SEMATECH, Austin, TX, USA ; Song, S.C. ; Choi, R. ; Wen, H.-C.
more authors

Metal/high-k gate stack technology is urgently required to continue the scaling of CMOS devices at the 45nm node. However, the challenges of simultaneously implementing metal gate and high-k gate dielectrics into the 45nm technology node have not been addressed. This paper reviews recent advanced gate stack technology to illuminate some of the technical challenges in this area.

Published in:
Integrated Circuit Design and Technology, 2005. ICICDT 2005. 2005 International Conference on

Date of Conference: 9-11 May 2005

Page(s):
73 - 76
Print ISBN:
0-7803-9081-4
INSPEC Accession Number:
8531354
Digital Object Identifier :
10.1109/ICICDT.2005.1502595
Product Type:
Conference Publications

IEEE Account

Purchase Details

Profile Information

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.