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Chemical etching of sacrificial layers is a widely used technique in surface micromachining. The causes of the triangle at the etch front are analyzed. The viewpoint that stress is the major factor of the triangle's formation is put forward. Through a study of the mechanism of the effects of annealing on etch rate, several rules about different annealing conditions having different effects on the etch rate are advanced.
Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on (Volume:3 )
Date of Conference: 18-21 Oct. 2004