Cart (Loading....) | Create Account
Close category search window

Preparation of nano-structure amorphous carbon film and its field emission properties

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

6 Author(s)
Zhang, Xinyue ; Dept. of Phys., Zhengzhou Univ., China ; Lu, Zhanling ; Zhang, Binglin ; Ning Yao
more authors

Nano-structure amorphous carbons films were fabricated on n-Si(111) substrates coated with titanium by microwave plasma chemical vapor deposition (MPCVD) system. The source gas was a mixture of H2 and CH4 with the flow rates of 100 sccm and 16 sccm, respectively. During the deposition, the total pressure of 6.0 KPa, substrates temperature of 830°C and microwave power of 1700W which were kept for 4 hours. The surface morphology and the nano-structure of the films were tested by field emission scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman scattering spectroscopy and X-ray photoelectron spectroscopy (XPS). The results show that the film consists of carbon grain size of no more than 100 nm and the main component was amorphous carbon with the mixture of sp2 and sp3 bond. Field emission of as-deposited film was then measured at a vacuum of below 5×10-5Pa. It was found that the initial turn-on field was very low, which was about 0.6 V/μm; the current density of 2.5mA/cm2 was obtained under an electric field of 3.7 V/μm. The emission sites density was estimated to be more than 104/cm2 at electric field of 3.7V/μm. All these characteristics indicate that such deposited nano-structure amorphous carbon film is an efficient cold cathode material.

Published in:

Vacuum Electron Sources Conference, 2004. Proceedings. IVESC 2004. The 5th International

Date of Conference:

6-10 Sept. 2004

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.