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Study of the atomic and molecular radiation in shadow mask PDP

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6 Author(s)
Yan Tu ; Dept. of Electron. Eng., Southeast Univ., Nanjing, China ; Lanlan Yang ; Zhang, Xiong ; Baoping Wang
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The discharge process in a discharge cell of shadow mask plasma display panel (SM-PDP) has been calculated by means of fluid model. The relation between content of xenon in Ne-Xe mixture gas, pressure and efficiency has been investigated for SM-PDP. Simulation results show that the resonance xenon responsible for 147nm UV decreases with the increasing of the content of xenon and pressure, while the molecular xenon, radiating 173nm UV, increases. The efficacy of SM-PDP could be enhanced further if the phosphor is selected carefully considering of this conclusion.

Published in:
Vacuum Electron Sources Conference, 2004. Proceedings. IVESC 2004. The 5th International

Date of Conference: 6-10 Sept. 2004

Page(s):
187 - 189
Print ISBN:
0-7803-8437-7
INSPEC Accession Number:
8382533
Digital Object Identifier :
10.1109/IVESC.2004.1414188
Product Type:
Conference Publications

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