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An optically differential reconfigurable gate array using a 0.18 μm CMOS process

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2 Author(s)
Watanabe, M. ; Dept. of Syst. Innovation & Informatics, Kyushu Inst. of Technol., Fukuoka, Japan ; Kobayashi, F.

This paper presents the design of a high-density optically differential reconfigurable gate array (ODRGA) using a 0.18μm-5 metal CMOS process technology. ODRGA is a type of field programmable gate arrays (FPGAs). However, unlike conventional FPGAs, ODRGAs are reconfigured optically using an external optical system. Although ODRGAs have already been fabricated using a 0.35μm-3 metal CMOS process technology, their gate-density remains unsatisfactory. For that reason, a new ODRGA-VLSI chip with four logic blocks, five switching matrices, and 16 I/O bits was fabricated on a 7.82mm2 chip using more advanced process technology. This paper presents the detailed design of a fabricated ODRGA-VLSI chip, the optical reconfiguration circuit, the gate array structure, the CAD layout, and an ODRGA-VLSI chip mounted on an estimation board. This study also includes experimental results regarding the reconfiguration period.

Published in:

SOC Conference, 2004. Proceedings. IEEE International

Date of Conference:

12-15 Sept. 2004