By Topic

Investigation of conductive transparent In2O3 thin films deposited by triode sputtering

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Axelevitch, A. ; Holon Acad. Inst. of Technol., Israel ; Gorenstein, B. ; Verdyan, A. ; Golan, G.

Conductive transparent thin films play a significant role in the today's electronics and optical technologies. Displays of various types, photovoltaic systems, and optoelectronic devices use these films as transparent signal electrodes or heating surfaces. In our work, conductive transparent indium oxide (In2O3) thin films were prepared using a novel implementation of the triode sputtering method. A pure In2O3 target of 2 inch in diameter was used for sputtering in a laboratory triode system provided with a plane plasma discharge at relatively low pressure (0.5-5 mTorr) of pure argon (Ar). The substrate temperature was varied during experiments from room temperature up to 200°C. The films were deposited on optical glass slides of 1 mm thick. The resultant films were characterized for their optical and electrical properties and compared with the In2O3 films deposited by magnetron sputtering.

Published in:

Electrical and Electronics Engineers in Israel, 2004. Proceedings. 2004 23rd IEEE Convention of

Date of Conference:

6-7 Sept. 2004