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Nanometer-thin titania films with SAM-level stiction and superior wear resistance for reliable MEMS performance

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6 Author(s)
Ashurst, W.R. ; California Univ., Berkeley, CA, USA ; Jang, Y.J. ; Magagnin, L. ; Carraro, C.
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Most MEMS devices involving contacting surfaces suffer from stiction and wear. While the development of self-assembled monolayer (SAM)-based processes has virtually eliminated stiction, wear remains a serious reliability issue. In this paper, the use of titania ultra-thin films as a means to reduce both stiction and wear is reported. Atomic layer deposition (ALD) is used for the film growth in order to ensure a uniform and conformal coating, effectively encapsulating the released polysilicon microelectromechanical systems (MEMS) devices. The application of 10-nm thin titania coating is shown to result in improved reliability of test microdevices. To further improve reliability, a vapor phase SAM coating is applied to TiO2 encapsulated micromachines. Results on the tribological properties of both TiO2-and SAM coated TiO2-encapsulated microdevices are presented.

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Micro Electro Mechanical Systems, 2004. 17th IEEE International Conference on. (MEMS)

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