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MISiC-FET devices with bias controlled baseline and gas response

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9 Author(s)
Nakagomi, Shinji ; Sch. of Sci. & Eng., Ishinomaki Senshu Univ, Miyagi, Japan ; Takahashi, M. ; Savage, S. ; Uneus, L.
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The drain current-voltage characteristics of a chemical gas sensor based on a catalytic metal insulator silicon carbide field effect transistor (MISiC-FET) was measured in H2 and O2 ambient while applying negative substrate bias at temperatures up to 600°C. It is reported that the gas sensitivity can be amplified and the position of the base-line controlled by applying a negative substrate bias to the MISiC-FET device, which is a buried short channel device. This is possible in a wide range of drain current levels and over a large temperature range.

Published in:
Sensors, 2003. Proceedings of IEEE  (Volume:2 )

Date of Conference: 22-24 Oct. 2003

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