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New development of nanoimprint technology

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1 Author(s)
L. J. Guo ; Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA

Summary form only given. In this paper, the Step-and-Flash Imprint Lithography (S-FIL), pattern replication is done non-traditionally by mechanical deforming the resist materials, which completely free itself from the resolution-limiting factors such as light diffraction or beam scattering that are often inherent with the more traditional approaches. Nanoimprint has the capability of patterning sub-10 nm structures, yet only entails simple equipment setup and easy processing. We also developed a reversed imprinting technique that allows nanopattering on flexible substrate and on non-flat surfaces, as well as the creation of 3D polymer nanostructures.

Published in:

Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International

Date of Conference:

29-31 Oct. 2003