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In this paper, the Step-and-Flash Imprint Lithography (S-FIL), pattern replication is done non-traditionally by mechanical deforming the resist materials, which completely free itself from the resolution-limiting factors such as light diffraction or beam scattering that are often inherent with the more traditional approaches. Nanoimprint has the capability of patterning sub-10 nm structures, yet only entails simple equipment setup and easy processing. We also developed a reversed imprinting technique that allows nanopattering on flexible substrate and on non-flat surfaces, as well as the creation of 3D polymer nanostructures.
Date of Conference: 29-31 Oct. 2003