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Interdiffusion in InGaAs quantum dots by ion implantation

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5 Author(s)
P. Lever ; Dept. of Electron. Mater. Eng., Australian Nat. Univ., Canberra, ACT, Australia ; H. H. Tan ; P. Reece ; M. Gal
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Implantation induced interdiffusion of InGaAs quantum dots has been carried out using hydrogen and arsenic ions. Large energy shifts and significant narrowing was seen in the photoluminescence spectra of the implanted and annealed samples. Lower implantation doses were required to create similar energy shifts in quantum dot samples than reported in the quantum well case. The energy shifts and photoluminescence intensities were found to depend on the ions used, as well as the amount of damage created in the samples. Temperature dependent implantations were found to follow the trends reported for quantum wells.

Published in:

Optoelectronic and Microelectronic Materials and Devices, 2002 Conference on

Date of Conference:

11-13 Dec. 2002