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A high fill factor 1 × N spatial light modulator based on an epitaxial polysilicon process

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4 Author(s)
Dokmeci, M.R. ; Corning Intellisense, Wilmington, MA, USA ; Pareek, A. ; Kirkos, G. ; Bernstein, J.

This study introduces novel spatial light modulator (SLM) designs with flat micromirrors which require no etch release holes. A combination of surface micromachining and epitaxial polysilicon process is used in device fabrication. This process minimizes insertion loss since it is based on the requirements of MEMS based optical systems.

Published in:

Optical MEMS, 2003 IEEE/LEOS International Conference on

Date of Conference:

18-21 Aug. 2003

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