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This paper describes the organization and operation of an introductory, dual level (senior/graduate) laboratory course on semiconductor device processing that is based on the fabrication and testing of GaAs MESFETs. The course is organized into a weekly lecture with a corresponding laboratory session. Over the period of one quarter, the students are led through a four mask process for fabricating n-channel GaAs MESFETs. The last three weeks of the course are utilized to perform electrical characterization of the devices and test structures incorporated in the test chip. This paper provides a description of the breakdown of the fabrication process in weekly increments, the topics covered in the accompanying lecture, resource materials provided to the student, methods used for student assessment, facilities and staffing requirements, and student capacity.